Materials Characterization & Development
Team Leads: Dr. Brent Wagner, Dr. Jud Ready, Stephan Turano
2011-2012: Georgia Tech Research Institute has adapted an ion-assisted deposition tool for use as a controlled plasma exposure environment for BN samples to supply GTMM and UA. With support from GT HPEPL, GTRI has characterized the energetics and plasma potentials achievable in the device, as detailed knowledge of sample exposure history is essential to the collaborative investigation. Additionally, GTRI has worked with GTMM characterize the roughness of BN samples using contact profilometry and employed Scanning Electron Microscopy (SEM) and Energy-Dispersive X-Ray Spectrometry (EDX), finding measurable implanted Xenon in samples from a stored HET channel.
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